Title:
塩、酸発生剤、レジスト組成物及びレジストパターンの製造方法
Document Type and Number:
Japanese Patent JP6695203
Kind Code:
B2
Abstract:
PROBLEM TO BE SOLVED: To provide a salt, an acid generator, a resist composition, and others, from which a good resist pattern excellent in CD uniformity can be produced.SOLUTION: The salt is represented by formula (I); and the acid generator and the resist composition contain the salt. In the formula, Qand Qeach represent a fluorine atom or a perfluoroalkyl group; Rand Reach represent a hydrogen atom, a fluorine atom, or a perfluoroalkyl group; z represents an integer of 0 to 6; X1 represents *-CO-O- or the like; Aand Aeach represent a single bond or *-L-CO-O-(L-CO-O)-; Land Leach represent a divalent hydrocarbon group; g represents 0 or 1; Arepresents a single bond or a divalent hydrocarbon group; Rrepresents an alicyclic hydrocarbon group, in which two hydrogen atoms in the alicyclic hydrocarbon group may be replaced by two oxygen atoms to form a ketal structure which may include a fluorine atom; and Zrepresents an organic cation.SELECTED DRAWING: None
Inventors:
Yukako Adachi
Koji Ichikawa
Koji Ichikawa
Application Number:
JP2016081935A
Publication Date:
May 20, 2020
Filing Date:
April 15, 2016
Export Citation:
Assignee:
Sumitomo Chemical Co., Ltd.
International Classes:
C07C309/17; C07D321/10; C08F220/18; C09K3/00; G03F7/004; G03F7/039; G03F7/20
Domestic Patent References:
| JP2013147485A | ||||
| JP2011037837A | ||||
| JP2012097074A | ||||
| JP2009244859A | ||||
| JP2011016794A | ||||
| JP2010039145A | ||||
| JP2008069146A | ||||
| JP2012252322A | ||||
| JP2016113454A |
Attorney, Agent or Firm:
Shinki Global IP Patent Corporation