Title:
METHOD FOR PRODUCING SPUTTERED FILM AND OPPOSITE TARGET TYPE SPUTTERING DEVICE
Document Type and Number:
Japanese Patent JP3783749
Kind Code:
B2
Abstract:
PROBLEM TO BE SOLVED: To produce sputtered film at a high speed by applying AC voltage with phases diverged by 180 degrees to two targets.
SOLUTION: A pair of metallic targets 2 are arranged in the main body of a device respectively opposite at a prescribed distance. The metallic targets 2 are held by holds 3 and are connected to a sputtering power source 4 via them. Relating to the sputtering power source 4, a signal generator 4a synchronizes primary and secondary amplifiers 4b and 4c, makes AC signals of certain frequencies diverged by 180 degrees by a suitable circuit 4d from signals gone out from the signal generator 4a and applies high alternating currents of high voltage with phases diverged by 180 degrees to each other by the primary amplifier 4b and the secondary amplifier 4c. Then, the primary amplifier 4b is connected one holder 3, and the secondary amplifier is connected to the other hold 3, by which the AC voltage with phase diverged by 180 degrees is applied to the mutually opposite targets 2.
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Inventors:
Masato Yoshikawa
Tomoko Noguchi
Tomoko Noguchi
Application Number:
JP20385697A
Publication Date:
June 07, 2006
Filing Date:
July 14, 1997
Export Citation:
Assignee:
Bridgestone Corporation
International Classes:
C23C14/08; C23C14/34; (IPC1-7): C23C14/34; C23C14/08
Domestic Patent References:
| JP58213875A | ||||
| JP61060908B1 | ||||
| JP58204175A | ||||
| JP63121658A |
Attorney, Agent or Firm:
Takashi Kojima
Yuko Nishikawa
Yuko Nishikawa