To efficiently and continuously produce a thin transparent film having high heat resistant and superior homogenous quality, the film which is manufactured from a photocurable resin.
There is provided a method for producing the transparent film by flow casting of a liquid photocurable resin composition on a transparent base film; laminating the transparent cover film on the photocurable resin composition to make the laminate having the transparent layer on both sides of the photocurable resin layer; curing the photocurable resin layer by irradiating at least one surface of the laminate with the ultraviolet; and cutting and removing the laminate end afterwards by a cut slit device. The transparent cover film is the film produced from the material identical with the transparent base film by a biaxial stretching method, and the temperature (T) to cure the photocurable resin by the ultraviolet irradiation meets the condition shown by the formula Tg+50°C≤T<Tm against the glass transition temperature (Tg) and the melting temperature (Tm) of the transparent base film and the transparent cover film.
ANDO MASAYOSHI
KITAMURA KENICHI
| JPH07124969A | 1995-05-16 | |||
| JPH07100835A | 1995-04-18 | |||
| JP2002011739A | 2002-01-15 | |||
| JP2002011740A | 2002-01-15 | |||
| JP2002011741A | 2002-01-15 | |||
| JPH05138667A | 1993-06-08 | |||
| JP2002011742A | 2002-01-15 | |||
| JP2003231140A | 2003-08-19 | |||
| JP2002012682A | 2002-01-15 | |||
| JP2003285338A | 2003-10-07 | |||
| JPH07124969A | 1995-05-16 | |||
| JPH07100835A | 1995-04-18 | |||
| JP2002011739A | 2002-01-15 | |||
| JP2002011740A | 2002-01-15 | |||
| JP2002011741A | 2002-01-15 | |||
| JPH05138667A | 1993-06-08 | |||
| JP2002011742A | 2002-01-15 | |||
| JP2003231140A | 2003-08-19 |