Title:
METHOD OF PRODUCING VAPOR DEPOSITION MASK
Document Type and Number:
Japanese Patent JP2023051549
Kind Code:
A
Abstract:
To provide a method of producing a vapor deposition mask having excellent vapor deposition efficiency by a simple scheme.SOLUTION: A method of producing a vapor deposition mask includes forming a first plating layer using a resist pattern as a mask, deforming the resist pattern, and forming a second plating layer on the first plating layer using the deformed resist pattern as a mask. By deforming the resist pattern, the deformed resist pattern may be overlaid on a portion of the first plating layer.SELECTED DRAWING: Figure 5
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Inventors:
FUKUDA KAICHI
Application Number:
JP2021162326A
Publication Date:
April 11, 2023
Filing Date:
September 30, 2021
Export Citation:
Assignee:
JAPAN DISPLAY INC
International Classes:
C25D1/10; C23C14/04; H05B33/10; H10K50/00
Attorney, Agent or Firm:
Patent Attorney Corporation Takahashi Hayashi and Partners