Title:
集束粒子ビームを用いて基板を処理する方法及び装置
Document Type and Number:
Japanese Patent JP5930022
Kind Code:
B2
Abstract:
The invention relates to method for removing excessive material from a substrate (105), the method comprising the steps of: (a) depositing a removable material around the excessive material using a focused particle beam (127) and at least one deposition gas; and (b) removing the excessive material together with the removable material.
Inventors:
Brett Ristan
Spies petra
Hoffman Solsten
Spies petra
Hoffman Solsten
Application Number:
JP2014506858A
Publication Date:
June 08, 2016
Filing Date:
April 26, 2012
Export Citation:
Assignee:
Carl Zeiss SGM Game Beher
International Classes:
G03F1/74; C23C16/48; G03F1/44; G03F1/84; H01J37/30
Domestic Patent References:
| JP7122484A | ||||
| JP10090876A | ||||
| JP4050844A | ||||
| JP11330209A | ||||
| JP2006350219A | ||||
| JP2004251964A | ||||
| JP2006156179A | ||||
| JP2010085778A |
Attorney, Agent or Firm:
Koichi Tsujii
Sadao Kumakura
Fumiaki Otsuka
Takaki Nishijima
Hiroyuki Suda
Hiroshi Uesugi
Yoshinori Kishi
Sadao Kumakura
Fumiaki Otsuka
Takaki Nishijima
Hiroyuki Suda
Hiroshi Uesugi
Yoshinori Kishi