Title:
MICRO-VACUUM ELEMENT AND MANUFACTURE THEREOF
Document Type and Number:
Japanese Patent JP3245948
Kind Code:
B2
Abstract:
PURPOSE: To form a tapered edged on the cathode of a micro-vacuum element with good reproducibility and uniformity.
CONSTITUTION: An SOI substrate is used as a starting substrate, and a (100) silicon single crystalline layer 1 on the substrate is etched by an anisotropic etching liquid such as hydrazine so as to form an edge tapered hole having a (111) surface reaching an oxide film 2. An insulated film in the hole is etched and a vacancy 9 is formed. The etching can be carried out with extremely good reproducibility and uniformity. The silicon 1 is etched again thereafter and is divided into a cathode 6 and a gate 7, while the substrate 3 is used as an anode 8, and a micro-vacuum element is thus provided. When a phosphor is accumulated in the vacancy 9, an emission element is provided. when reflection mirrors of different transmission factors are arranged so that an emission region is sandwiched thereby to form a resonator, laser oscillation is made possible.
Inventors:
Keizo Yamada
Application Number:
JP10508492A
Publication Date:
January 15, 2002
Filing Date:
April 24, 1992
Export Citation:
Assignee:
NEC
International Classes:
H01J1/304; H01J1/62; H01J3/02; H01J5/16; H01J9/02; H01J21/10; H01J29/04; H01J29/18; H01J29/89; H01J31/12; H01S3/06; (IPC1-7): H01J1/304; H01J1/62; H01J5/16; H01J9/02; H01J29/04; H01J29/18; H01J29/89; H01J31/12; H01S3/06
Domestic Patent References:
| JP5190078A | ||||
| JP3252025A | ||||
| JP3225725A | ||||
| JP422038A | ||||
| JP3276543A | ||||
| JP5159696A |
Attorney, Agent or Firm:
Naoki Kyomoto (2 outside)