Title:
混合器、薄膜製造装置及び薄膜製造方法
Document Type and Number:
Japanese Patent JP4157040
Kind Code:
B2
Abstract:
The present invention relates to a thin film-manufacturing system, which has a simple structure and can be manufactured at a low cost and which also permits the inhibition of the generation of any turbulent flow, convection current and heat convection and the formation of a uniform gas stream of a mixed gas, wherein a stage 53 for placing a substrate thereon is disposed within the vacuum reactor 2 and a gas head 57 for supplying the film-forming gas to the central area on the top face of the vacuum reactor 2 is arranged in such a manner that the head is opposed to the stage 53. A cylindrical sleeve member 61 having a desired length is disposed while it comes in close contact with the side wall of the stage 53 to thus surround the periphery of the stage and the height of the stage can be established at the position at which the volume of a second space formed below the stage and connected to a vacuum discharge means is larger than that of the first space, in such a manner that an exhaust gas is isotropically discharged from a first space formed by the gas head and the upper face of the stage without causing any convection current therein through the interstice between the sleeve member and the inner wall surface constituting the reactor.
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Inventors:
Kiichi Yamada
Ken Masuda
Kajinuma Masahiko
Masaki Uematsu
Zhou Benkou
Ken Masuda
Kajinuma Masahiko
Masaki Uematsu
Zhou Benkou
Application Number:
JP2003549588A
Publication Date:
September 24, 2008
Filing Date:
December 03, 2002
Export Citation:
Assignee:
ULVAC, Inc.
International Classes:
C23C16/455; B01F23/10; B01J4/00; B01J10/02; B01J19/24; C23C16/44; C23C16/458; H01L21/00
Domestic Patent References:
| JP6124903A | ||||
| JP59156418A | ||||
| JP62075830U | ||||
| JP60255132A |
Attorney, Agent or Firm:
Masaaki Yamashita