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Title:
MONOMER, POLYMER, PRODUCTION OF MONOMER, PRODUCTION OF POLYMER, PHOTORESIST, PRODUCTION OF PHOTORESIST AND SEMICONDUCTOR ELEMENT
Document Type and Number:
Japanese Patent JPH11286469
Kind Code:
A
Abstract:

To obtain the subject new compound comprising a bicycloalkene derivative and useful for providing a polymer having excellent etching and heat resistances, adhesive strength and resolution.

This compound comprises a bicycloalkene derivative represented by the formula [R! and R" are each H or a 1-4C alkyl; (m) is 1-8; (n) is 1-6], e.g. tertiary butyl 5-norbornene-2-carboxylate. The compound is obtained by mixing cyclopentadiene with a tetrahydrofuran solvent, adding a hydroxyalkyl acrylate (e.g. 3-hydroxypropyl acrylate or 4-hydroxybutyl acrylate) to the resultant reactant, stirring and reacting the reactants, removing the solvent from the product after the reaction and affording a bicycloalkene derivative represented by the formula (e.g. 3-hydroxypropyl 5-norbornene-2-carboxylate or 4-hydroxybutyl 5-norbornene-2-carboxylate) which is the resultant product.


Inventors:
JUNG MIN HO
JUNG JAE CHANG
BOK CHEOL KYU
BAIK KI HO
Application Number:
JP36751898A
Publication Date:
October 19, 1999
Filing Date:
December 24, 1998
Export Citation:
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Assignee:
HYUNDAI ELECTRONICS IND
International Classes:
C07C67/347; C07C69/753; C08F4/04; C08F22/06; C08F32/00; C08F222/06; C08F232/08; G03F7/004; G03F7/027; (IPC1-7): C07C69/753; C08F22/06; C08F32/00; G03F7/004; G03F7/027
Attorney, Agent or Firm:
Hiroshi Arafune (1 person outside)