Title:
MULTI-BEAM EXPOSURE METHOD AND DEVICE
Document Type and Number:
Japanese Patent JP2005024831
Kind Code:
A
Abstract:
To provide a multi-beam exposure method and its device in which the interval of joints by one scanning is made less noticeable in multi-beam scanning exposure.
In the multi-beam exposure method, image recording is performed by using a heat mode sensitive material as the recording medium and making scanning exposure with a multi-beam. The method is characterized in that the interval between joints by one scanning (also called a swath interval) with the multi-beam is made narrower than the interval between a plurality of lines in one scanning with the multi-beam. The device gives a concrete form to this method.
Inventors:
FUKUDA TSUYOSHI
Application Number:
JP2003189539A
Publication Date:
January 27, 2005
Filing Date:
July 01, 2003
Export Citation:
Assignee:
FUJI PHOTO FILM CO LTD
International Classes:
B41J2/32; B41J2/44; G02B26/10; G03F7/20; (IPC1-7): G02B26/10; B41J2/32; B41J2/44; G03F7/20
Attorney, Agent or Firm:
Nozomi Watanabe
Haruko Sanwa
Hiroshi Fukushima
Haruko Sanwa
Hiroshi Fukushima
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