Title:
MULTILAYERED STRUCTURE AND MANUFACTURE THEREOF
Document Type and Number:
Japanese Patent JP3425479
Kind Code:
B2
Abstract:
PURPOSE: To improve the retort resistance of a multilayered structure by forming the structure of an ethylene-vinyl acetate copolymer saponified matter a, a terminal regulating polyamide resin b, a hindered phenol compound c, an alkaline-earth metal salt d, and a compound e selected from ethylene bis-fatty acid amide, and layering a-e so as to have a specified relationship.
CONSTITUTION: An oxygen gas barrier resin composition (II), wherein a polymerization ratio of compounds a and b is (70:30) to (96:4), a mixing rate of c based on a total quantity of a and b is 0.01-1wt.%, a mixing rate of d based on the total quantity of a and b is 0.5-15μmol/g in terms of metal, and a mixing rate of e based on the total quantity of a and b is 0.01wt.%, is formed. Further, a thermoplastic resin layer (III) having a moisture permeability (measured under 40°C, 90%RH) lower than that of a thermoplastic resin layer (I) is provided as a most internal layer. Thus, a multilayer structure wherein change of oxygen gas barrier before and after retort disinfection treatment is only a little and gels and fish eyes do not occur can be obtained.
Inventors:
Masahiko Toyozumi
Tomoyuki Yamamoto
Tomoyuki Yamamoto
Application Number:
JP22560794A
Publication Date:
July 14, 2003
Filing Date:
August 26, 1994
Export Citation:
Assignee:
Nippon Synthetic Chemical Industry Co., Ltd.
International Classes:
B65D81/34; B32B27/00; B32B27/08; B32B27/28; B32B27/32; B32B27/34; B32B27/36; B65D65/40; C08L23/08; C08L31/04; (IPC1-7): B32B27/28; B32B27/32; B32B27/34; B65D65/40; B65D81/34
Domestic Patent References:
| JP229450A | ||||
| JP63179740A | ||||
| JP6182946A | ||||
| JP63236646A | ||||
| JP62202735A | ||||
| JP6345919A |
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