To provide a multitarget simultaneous pulse laser ablation deposition system (MTS-PLAD) and a target holder for the system.

The target holder comprises: a target rotation means for uniformly ablating a target; a direction change regulation means for the target rotation axis for directing a plasma plume emitted, by the ablation of target substance, to a direction vertical to the target face toward a substrate; and a flange to fix the target holder to a chamber. Further, a plurality of target holders, or a single flange multiple target holder provided with a plurality of functions of target holders are fitted to the chamber. By using a plurality of laser beams, the plurality of targets are simultaneously or alternately ablated. In the film deposition, additives for fabricating a semiconductor can simultaneously be doped, the correct compositional control in the film of multielemental components is made possible, and further the film deposition having reduced impurity grains and compositional variation and further having a wider area can be realized.