PURPOSE: To arbitrarily control the distribution of diffraction efficiency by adjusting the depth of grooves relating to the method for formation of the hologram of a surface relief type.

CONSTITUTION: A first positive resist 2 is applied on a substrate 1, is subjected to interference exposing by laser beams 3, 4 and is then subjected to development processing, by which sufficiently deep first groove shapes 7 are formed. The first groove shapes 7 are then adjusted in depth to the optimum depth determined by the space frequency to apply the desired efficiency. This adjustment is executed by irradiating the first groove shapes 7 with UV rays 9 to photoset the groove shapes, then freshly applying a second positive resist 10 therein to completely fill the grooves. In succession, the second positive resist is irradiated with one luminous flux of illuminating light to determine the depth of the grooves to be adjusted by the exposure. Finally, the positive resist is developed to form second groove shapes 13.