ELECTROSTATIC ATTRACTION HOLDER - SHINETSU CHEMICAL CO

Title:

ELECTROSTATIC ATTRACTION HOLDER

Document Type and Number:

Japanese Patent JPH0614570

Kind Code:

A

Abstract:

PURPOSE: To provide an electrostatic attraction holder having high electrostatic attractivity which can be mounted/demounted easily and causes no device damage when employed in a semiconductor process.

CONSTITUTION: In an electrostatic attraction device for electrostatically attracting a sample to a dielectric layer by applying a voltage onto a conductor coated with the dielectric layer, the dielectric layer is mainly composed of ceramic containing 0.5-30wt.% of silicon carbide with the volume resistivity of the dielectric layer being set in the range of 108-1013Ωcm at 20°C.

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Inventors:

KUBOTA YOSHIHIRO
KAWAI MAKOTO
KOJIMA SHINJI

Application Number:

JP19301892A

Publication Date:

January 21, 1994

Filing Date:

June 26, 1992

Export Citation:

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Assignee:

SHINETSU CHEMICAL CO

International Classes:

B23Q3/15; H01L21/68; H01L21/683; H02N13/00; (IPC1-7): H02N13/00; B23Q3/15; H01L21/68

Attorney, Agent or Firm:

Ryoichi Yamamoto (1 person outside)

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