PURPOSE: To provide an X-ray exposure mask and its mask blank which can improve alignment accuracy and improve emitted light irradiation resistance during X-ray exposure.
CONSTITUTION: A main part of this device is composed of a frame body 2, a transmitting supporting film 3 whose circumferencial edge part is held by the frame body 2 and an X-ray absorber 4 formed on the transmitting supporting film 3 to a pattern. The transmitting supporting film 3 is constituted of three layers of an intermediate layer 32 consisting of silicon nitride, and an upper layer 33 and a lower layer 31 which are provided to both sides of the intermediate layer and have refraction factor less than that of the intermediate layer and have nitrogen content rate higher than that thereof. Since the upper layer 33 and the lower layer 31 work as a reflection preventing film, influence of thin film multiple reflection interference is restrained. Furthermore, since the upper layer 33 and the lower layer 31 are close to stoichiometry ratio, surface oxidation during X-ray exposure is also prevented.
TANAKA SHOJI
KITAMURA TOMOHITO
MATSUO TADASHI
