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Title:
POLISHING MATERIAL AND POLISHING METHOD
Document Type and Number:
Japanese Patent JPH058168
Kind Code:
A
Abstract:

PURPOSE: To prevent generation of an unpolished part for a polishing material of a member for an electronic part comprising tungsten or the like by forming it to be a polar body having a larger diameter and height than sizes of a recess formed in a subject work.

CONSTITUTION: A polishing material 12 for polishing a member 20 having a polar part 22 through a circular groove part 23 in a polar part 21 as illustrated, for example, is formed of the same material as the member 20 to be polar. A diameter D1 and a height H of it are set to be larger than the sizes of the groove part 23. For example, when a width W of the groove part 23 of the member 20 is 1mm, the diameter D1 and the height H of the polishing member 12 are set to exceed 1.0mm and not more than 3.0mm, This polishing material 12 is formed by pressing and sintering by powder metallurgy, and chamfered parts R are formed.


Inventors:
YASHIRO KATSUYUKI
FUKAYA YOSHITAKE
Application Number:
JP18826591A
Publication Date:
January 19, 1993
Filing Date:
July 03, 1991
Export Citation:
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Assignee:
TOKYO TUNGSTEN KK
International Classes:
B24B31/14; B24B31/16; (IPC1-7): B24B31/14; B24B31/16
Domestic Patent References:
JPS4912314U1974-02-01
JPS6228168A1987-02-06
Attorney, Agent or Firm:
Yosuke Goto (2 outside)