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Title:
NANO-MASK WHICH CAN SURELY BE ATTACHED
Document Type and Number:
Japanese Patent JP2007312991
Kind Code:
A
Abstract:

To provide a face mask made of a woven fabric or a non-woven fabric which has a recess section for the nose, an extended jaw point space, and a cheek region which fits without gaps and does not move upward or downward when the jaw is moved.

A loop is formed around the ears with both straps by following the anatomical profile of the face, and respectively arranging the upper strap of slightly elastic holding straps, and arranging the lower strap from the central point of this mask to the lower side of the ear. The force of the overall mask and the vectors go in the directions enclosing the equilibrium of the mask, and therefore, the movement of the mask in any direction is stopped by a force in the other direction. In addition, a nano-technology antibacterial component which holds a membrane-bound microbe, extinguishes it, and also, protects a wearer from allergens such pollens and similar substances is incorporated. Thus, the mask presents the protection to the cross contaminations and infections.

COPYRIGHT: (C)2008,JPO&INPIT


Inventors:
CHIAM KIA CHEE
Application Number:
JP2006145286A
Publication Date:
December 06, 2007
Filing Date:
May 25, 2006
Export Citation:
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Assignee:
CHIAM KIA CHEE
International Classes:
A62B18/02
Attorney, Agent or Firm:
Wintech Patent Business Corporation



 
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