NATURATRON SPUTTERING SYSTEM - NATURA TECHNOLOGY INC

Title:

NATURATRON SPUTTERING SYSTEM

Document Type and Number:

Japanese Patent JP2015172249

Kind Code:

A

Abstract:

PROBLEM TO BE SOLVED: To provide a naturatron sputtering system that complies with various needs and is high in flexibility.SOLUTION: A naturatron sputtering system 2 is provided with a sputtering section, where paired targets 9 are arranged opposite to each other with a spacing, and magnets for forming a magnetic field space between the targets 9 are arranged on back sides of the targets 9, respectively, in a vacuum container 1. The magnetic field space has a magnetic field distribution which is high in magnetic flux density at the peripheral part and low in magnetic flux density at the center part. Further, the naturatron sputtering system 2 has a substrate arranged on the lateral side of the space between the targets 9, while facing the magnetic field space. The magnets includes main magnets 12 and auxiliary magnets 11, which cooperate with each other to change the magnetic flux density at the center part relatively to the magnetic flux density at the peripheral part.

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Inventors:

HIRATA TOYOAKI

Application Number:

JP2015092902A

Publication Date:

October 01, 2015

Filing Date:

April 30, 2015

Export Citation:

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Assignee:

NATURA TECHNOLOGY INC

International Classes:

C23C14/35; C23C14/34

Domestic Patent References:

JPS62285253A	1987-12-11
JP2010013724A	2010-01-21
JPWO2009139434A1	2011-09-22

Attorney, Agent or Firm:

Noboru Fujimoto
Hiroaki Nakatani

Previous Patent: JP2015172248

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