NEW COMPOUND, RESIST COMPOSITION AND METHOD FOR FORMING PATTERN

Japanese Patent JP2011037834

A

To provide a compound capable of forming patterns having excellent pattern resolution and line edge roughness, and to provide a resist composition using the same.

There is provided a compound represented by formula (I-Pb), [wherein, XPb is a single bond or -O-; RPb is a single bond, a divalent aliphatic hydrocarbon group, an alicyclic hydrocarbon group or an aromatic hydrocarbon group; methylene groups contained in the aliphatic hydrocarbon group and the alicyclic hydrocarbon group each may be replaced by an oxygen atom or a carbonyl group; YPb is a polymerizable group; ZPb is an organic group; XPc is a single bond or an alkylene group; RPc is an aliphatic hydrocarbon group, an alicyclic hydrocarbon group or an aromatic hydrocarbon group which may have one or more substituents; methylene groups contained in the aliphatic hydrocarbon group and the alicyclic hydrocarbon group each may be replaced by oxygen atom or a carbonyl group].

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ICHIKAWA KOJI
SUGIHARA MASAKO
YAMASHITA HIROKO

JP2010155687A

February 24, 2011

July 08, 2010

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SUMITOMO CHEMICAL CO

C07C381/12; C07C25/02; C07C57/055; C07C63/64; C07C69/54; C08F20/38; G03F7/004; G03F7/039

JPH08509820A	1996-10-15
JP2005067041A	2005-03-17
JP2002107929A	2002-04-10
JP2004102031A	2004-04-02
JP2008239918A	2008-10-09
JP2005014603A	2005-01-20
JP2001343742A	2001-12-14
JPH11327162A	1999-11-26
JP2010275431A	2010-12-09

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