Title:
SALT, ACID GENERATOR, RESIST COMPOSITION, AND METHOD FOR PRODUCING RESIST PATTERN
Document Type and Number:
Japanese Patent JP2023021058
Kind Code:
A
Abstract:
To provide a salt which allows a resist pattern having good CD uniformity to be produced, an acid generator, and a resist composition containing the same.SOLUTION: There are provided a salt represented by formula (IA) or formula (IB), an acid generator, and a resist composition. [In the formulae, Q1 and Q2 each independently represent a fluorine atom, a perfluoroalkyl group or the like; R1 and R2 each independently represent a hydrogen atom, a fluorine atom, a perfluoroalkyl group or the like; and A1 represents a hydrocarbon group containing a cyclic hydrocarbon group, provided that the hydrocarbon group may have a substituent and -CH2- contained in the hydrocarbon group may be substituted with -O-, -S-, -CO- or -SO2-.]SELECTED DRAWING: None
Inventors:
ADACHI YUKAKO
NISHITANI NOBUHIKO
ICHIKAWA KOJI
NISHITANI NOBUHIKO
ICHIKAWA KOJI
Application Number:
JP2022120679A
Publication Date:
February 09, 2023
Filing Date:
July 28, 2022
Export Citation:
Assignee:
SUMITOMO CHEMICAL CO
International Classes:
G03F7/004; C07C381/12; C07D213/30; C07D405/12; C07D493/18; C09K3/00; G03F7/038; G03F7/039; G03F7/20
Attorney, Agent or Firm:
Shinki Global IP Patent Corporation