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Title:
半導体高分子製品に有用な単量体の新規な製造
Document Type and Number:
Japanese Patent JP4955213
Kind Code:
B2
Abstract:
Asymmetric fluorene compounds are formed by reacting an amide starting material; reacting the resultant ketone with a further equivalent of a different organometallic reagent; and a ring closing elimination reaction. Formation of a compound of formula (IV) comprises: (a) reacting a compound of formula (I) with a compound of formula S 1>-M, to give a compound of formula (II); (b) reacting the compound of formula (II) with a compound of formula S 2>-M to give a compound of formula (III); and (c) eliminating H 2X from the compound of formula (III) to give a compound of formula (IV). [Image] [Image] Ar 1>, Ar 2>optionally substituted aryl or heteroaryl groups; X : O, S, NH or NR; L : a bond or a linking group of 1-2 atoms; R, R 1>optionally substituted alkyl, aryl, alkylaryl, arylalkyl or heteroaryl groups; R 2>alkoxy, aryloxy, arylalkyloxy, alkylaryloxy, alkylthio, arylthio, alkylarylthio or arylalkylthio; S 1>, S 2>optionally substituted alkyl, aryl or heteroaryl groups; and M : comprises a metal, and linked to S 1> and S 2> by a carbon-metal bond. Hydrogen is bound to a carbon atom C' of Ar 2>. C' and carbon atom of C=X are separated by 3-5 atoms. An independent claim is also included for new compounds of formulae (V) and (VI). [Image] P : polymerizable group.

Inventors:
Wallace, Paul
Karls Towns
Pons, thomas
Application Number:
JP2004547609A
Publication Date:
June 20, 2012
Filing Date:
October 29, 2003
Export Citation:
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Assignee:
Merck Patent Game Behr
International Classes:
C07C17/35; C07C13/00; C07C25/22; C07C33/24; C07C41/18; C07C43/225; C07C49/163; C07D333/12; C07F5/02; C07F5/04; C09K11/00
Domestic Patent References:
JP2002527553A
JP4230348A
JP3190853A
JP10175939A
JP1165547A
JP61047436A
JP9509159A
JP8511273A
Foreign References:
WO2000066560A1
WO2001007031A1
Attorney, Agent or Firm:
Mikio Hatta