Title:
NONMAGNETIC GARNET SUBSTRATE
Document Type and Number:
Japanese Patent JP2015134700
Kind Code:
A
Abstract:
PROBLEM TO BE SOLVED: To provide a good quality nonmagnetic garnet substrate capable of preventing cracks from being generated in a garnet single crystal film grown by liquid phase epitaxy.SOLUTION: When the nonmagnetic garnet substrate having a plane orientation (111) and a thickness of 625±10 μm is measured by light having a wavelength of 520 nm, the maximum value in an in-plane distribution of retardation defined by a formula d(Ne-No) [d is a substrate thickness of 625±10 μm, Ne is a refractive index to extraordinary light, and No is a refractive index to ordinary light] is 10 nm or less. The substrate has the effect that cracks can be prevented from being generated in a garnet single crystal film to be grown since a residual strain inside the substrate is extremely small.
More Like This:
| JPS59141492 | GARNET MINERAL |
| JPS62166504 | MANUFACTURE OF MAGNETIC GARNET MAGNETIC ANISOTROPIC LAYER |
| WO/2021/177153 | SCINTILLATOR, AND METHOD FOR PRODUCING SINGLE CRYSTAL FOR SCINTILLATOR |
Inventors:
MATSUI MASAYOSHI
DOBASHI DAISUKE
TATSUMIYA KAZUKI
DOBASHI DAISUKE
TATSUMIYA KAZUKI
Application Number:
JP2014207195A
Publication Date:
July 27, 2015
Filing Date:
October 08, 2014
Export Citation:
Assignee:
SUMITOMO METAL MINING CO
International Classes:
C30B29/28; C30B33/02
Attorney, Agent or Firm:
Akira Ueda
Previous Patent: OXIDE FILM AND PROTON CONDUCTIVE DEVICE
Next Patent: CEMENT COMPOSITION AND CAVITY FILLING MATERIAL
Next Patent: CEMENT COMPOSITION AND CAVITY FILLING MATERIAL