NEW MATERIAL:The 1,2-qinonediazide compound of formula I (Ra is H, halogen or 1-4C alkyl; when m is ≤3, the plural Ra groups may be different atoms or groups; D is 1,2-naphthoquinonediazido-4-sulfonyl, 1,2-naphthoquinonediazido-5- sulfonyl or 1,2-benzoquinonediazido-4-sulfonyl; m is 1-5; n is integer of 1 to m; X is methylene or carbonyl; l is 3-10).
USE: Useful as a synthetic raw material for alkali-soluble resin and positive-type photoresist. The photoresist has high sensitivity, resolution, heat-resistance and process stability and is suitable for the production of a semiconductor integrated circuit element such as VLSI.
PREPARATION: The compound of formula I can be produce by esterifying the hydroxyl group of the compound of formula II e.g., with 1,2- naphthoquinonediazido-4-sulfonyl chloride.
KAMIMURA TERUHISA
HASEGAWA MASAZUMI
