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Title:
NOVEL SULFUR-CONTAINING AND ETHYLENICALLY UNSATURATED GROUP-CONTAINING COMPOUND, RADIATION-CURABLE COMPOSITION, AND CURED MATERIAL
Document Type and Number:
Japanese Patent JP2008248172
Kind Code:
A
Abstract:

To provide a radiation-curable composition which can be suitably used for producing a cured material capable of having a high refractive index and a high Abbe number.

There are provided a sulfur-containing and ethylenically unsaturated group-containing compound (A) prepared by reacting a sulfur-containing compound represented by formula (1) with a compound having an ethylenically unsaturated group, a radiation-curable composition containing compound (A) and a cured material. Also provided are a radiation-curable composition comprising the compound (A) and a photopolymerization initiator and a radiation-curable composition comprising a compound which is other than the compound (A) and has an alicyclic structure and an ethylenically unsaturated group.


Inventors:
OKUTSU RIE
RYU KANETAKE
SHIBAZAKI YUJI
ANDO SHINJI
UEDA MITSURU
SUGAWARA SHUICHI
KURIYAMA KEISUKE
ERIYAMA YUUICHI
TAKASE HIDEAKI
Application Number:
JP2007093285A
Publication Date:
October 16, 2008
Filing Date:
March 30, 2007
Export Citation:
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Assignee:
JSR CORP
TOKYO INST TECH
International Classes:
C08F20/38; C07D339/06
Attorney, Agent or Firm:
Kihei Watanabe