Title:
OFF-AXIS REFLECTION PHASE MICROSCOPE SYSTEM AND METHOD FOR OFF-AXIS PHASE MICROSCOPE
Document Type and Number:
Japanese Patent JP2018105875
Kind Code:
A
Abstract:
PROBLEM TO BE SOLVED: To provide a full field reflection phase microscope for measuring a surface shape at a high-speed frame rate.SOLUTION: The invention can combine low-coherence interferometry and off-axis digital holographic microscopy (DHM). The DHM using reflection can perform highly sensitive and single-shot imaging of cellular dynamics and can perform a depth-sensitive measurement by use of low coherence light source. By using a diffraction grating in a reference arm, an interference image of uniform contrast over the entire field-of-view can be generated despite the low-coherence light source. Because path-length sensitivity can be improved, the present invention is suitable for use of full-field measurement of membrane dynamics in live cells while having sub-nanometer-scale sensitivity.SELECTED DRAWING: Figure 1A
Inventors:
ZAHID YAQOOB
CHOI WONSHIK
MICHAEL S FELD
YAMAUCHI TOYOHIKO
CHOI WONSHIK
MICHAEL S FELD
YAMAUCHI TOYOHIKO
Application Number:
JP2018018640A
Publication Date:
July 05, 2018
Filing Date:
February 05, 2018
Export Citation:
Assignee:
MASSACHUSETTS INST TECHNOLOGY
HAMAMATSU PHOTONICS KK
HAMAMATSU PHOTONICS KK
International Classes:
G01B11/24; G01B9/02; G01J9/02; G01N21/17; G02B21/06
Domestic Patent References:
JP2006250849A | 2006-09-21 | |||
JP2007139543A | 2007-06-07 | |||
JPH10186283A | 1998-07-14 | |||
JP2005070675A | 2005-03-17 | |||
JP2009281992A | 2009-12-03 | |||
JP2008534929A | 2008-08-28 |
Attorney, Agent or Firm:
Longhua International Patent Service Corporation