Title:
OPERATION METHOD FOR ION BEAM IRRADIATION APPARATUS, AND THE ION BEAM IRRADIATION APPARATUS
Document Type and Number:
Japanese Patent JP3560154
Kind Code:
B2
Abstract:
PROBLEM TO BE SOLVED: To provide a means of realizing the high transport efficiency of ion beams, when implanting ions of low energy.
SOLUTION: This ion beam irradiation device comprises an ion source 1 for generating ion beams; a first mass analyzing electromagnet 2 for carrying out the mass separation of the ion beams generated from the ion source; an acceleration/deceleration tube 3 for accelerating or decelerating the ion beam mass-separated by the first mass analyzing electromagnet; an end station 7 with a substrate installed to irradiate the ion beams accelerated or decelerated by the acceleration/deceleration tube; and a high vacuum pump provided in between the acceleration/deceleration tube and the end station. In the operating method for the ion beam irradiation device, the exhaust performance of the high vacuum pump is lowered, when implanting monovalent single atom ion with low energy.
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Inventors:
Koji Iwasawa
Application Number:
JP2001074141A
Publication Date:
September 02, 2004
Filing Date:
March 15, 2001
Export Citation:
Assignee:
Nissin Electric Co., Ltd.
International Classes:
C23C14/48; H01J37/18; H01J37/317; H01L21/265; (IPC1-7): H01J37/317; C23C14/48; H01J37/18; H01L21/265
Domestic Patent References:
| JP11283552A | ||||
| JP4047655A | ||||
| JP11283551A | ||||
| JP2001126656A |