OPTICAL SYSTEM AND EXPOSURE SYSTEM PROVIDED WITH THE OPTICAL SYSTEM

Title:

OPTICAL SYSTEM AND EXPOSURE SYSTEM PROVIDED WITH THE OPTICAL SYSTEM

Document Type and Number:

Japanese Patent JP2003050349

Kind Code:

A

Abstract:

To provide an optical system having a satisfactory optical performance without being practically affected by double refraction even if an optical material, such as fluorite, having an intrinsic double refraction is used.

The optical system comprises a 5th group light transmitting member having a feature of practically transmitting light with a wavelength of ≤200 nm and being formed to have an optical axis aligned with a crystal axis [110] or a crystal axis practically optically equivalent to the crystal axis [110] and a 6th group light transmitting member having a feature of practically transmitting light with a wavelength ≤200 nm, and being formed to have an optical axis aligned with a crystal axis [110] or a crystal axis practically optically equivalent to the crystal axis [110]. The 5th group light transmitting member and the 6th group light transmitting member are so related in position as to be rotated about 90° from each other around the optical axis.

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Inventors:

YAMATO SOICHI
SHIRAISHI NAOMASA
OMURA YASUHIRO
TANAKA KAZUMASA

Application Number:

JP2001243319A

Publication Date:

February 21, 2003

Filing Date:

August 10, 2001

Export Citation:

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Assignee:

NIKON CORP

International Classes:

G02B13/24; G02B1/02; G02B5/30; G02B13/14; G02B27/28; G03F7/20; H01L21/027; (IPC1-7): G02B13/24; G02B1/02; G02B27/28; G03F7/20; H01L21/027

Attorney, Agent or Firm:

Takao Yamaguchi

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