Title:
マイクロリソグラフィ投影露光装置の光学系
Document Type and Number:
Japanese Patent JP5706519
Kind Code:
B2
Abstract:
An optical system of a microlithographic projection exposure apparatus includes at least one mirror arrangement having a plurality of mirror elements which are displaceable independently of each other for altering an angular distribution of the light reflected by the mirror arrangement. The optical system also includes a polarization-influencing optical arrangement including a first lambda/2 plate and at least one additional lambda/2 plate.
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Inventors:
Zenger Ingo
Ditman Olaf
Zimmermann Jorg
Ditman Olaf
Zimmermann Jorg
Application Number:
JP2013513603A
Publication Date:
April 22, 2015
Filing Date:
May 18, 2011
Export Citation:
Assignee:
Carl Zeiss SGM Gaehha
International Classes:
H01L21/027; G02B19/00; G03F7/20
Domestic Patent References:
| JP2009272624A | ||||
| JP2007527549A | ||||
| JP2005091539A | ||||
| JP2009510794A | ||||
| JP2011199285A | ||||
| JP2007227918A | ||||
| JP2007220767A | ||||
| JP2011164626A | ||||
| JP2012069945A |
Attorney, Agent or Firm:
Koichi Tsujii
Sadao Kumakura
Fumiaki Otsuka
Takaki Nishijima
Hiroyuki Suda
Hiroshi Uesugi
Yoshinori Kishi
Sadao Kumakura
Fumiaki Otsuka
Takaki Nishijima
Hiroyuki Suda
Hiroshi Uesugi
Yoshinori Kishi