Title:
OPTICAL WAVEGUIDE AND METHOD FOR FORMING THE SAME
Document Type and Number:
Japanese Patent JP3723101
Kind Code:
B2
Abstract:
PROBLEM TO BE SOLVED: To provide an optical waveguide and a method for forming the optical waveguide in which the difference between the refractive index of a core layer and that of a clad layer is sufficiently large, an optical loss is suppressed and a throughput is high.
SOLUTION: A quartz substrate 1 is prepared, on which a SiNx:H film 2 is formed with a plasma chemical vapor deposition (CVD) method, the film is selectively irradiated with an X-ray through a mask, a change in the refractive index of the irradiated part is induced, a core layer 3 of an optical waveguide in which irradiated part the refractive index is increased is formed and a clad layer 4 composed of a SiO2 film is formed with the plasma CVD method, thus the optical waveguide is completed.
Inventors:
Akazawa Department
Application Number:
JP2001210633A
Publication Date:
December 07, 2005
Filing Date:
July 11, 2001
Export Citation:
Assignee:
Nippon Telegraph and Telephone Corporation
International Classes:
G02B6/12; G02B6/122; G02B6/13; (IPC1-7): G02B6/13
Domestic Patent References:
| JP2239208A | ||||
| JP8169731A | ||||
| JP8184722A | ||||
| JP11287917A | ||||
| JP112737A | ||||
| JP9258052A |
Other References:
T.Inukai et al.,Japanese Journal of Applied Physics Part 1,May 1994, Vol.33 No.5A,p.2593-2598
Attorney, Agent or Firm:
Yoshihiko Izumi
Shigeru Kobayashi
Shigeru Kobayashi