DECOMPOSITION TREATMENT APPARATUS FOR ORGANIC HALOGEN COMPOUND AND METHOD FOR DECOMPOSITION-TREATING THE SAME COMPOUND

Japanese Patent JP3723102

B2

PROBLEM TO BE SOLVED: To provide a method capable of safely treating an organic halogen compound and/or organic halogen compound-containing substance, i.e., a PCB and/or PCB- containing substance without generating harmful materials even if it is the PCB housed in a container such as a transformer, and an apparatus used for the same method.
SOLUTION: This method for decomposition-treating the organic halogen compound is provided by using the decomposition treatment apparatus 1 having a vaporizing means 2 for melt-treating the organic halogen compound and/or organic halogen compound-containing material, i.e., the PCB and/or the PCB-containing material to generate vaporized gas (PCB vaporized gas), a thermal decomposing means 3 for thermally decomposing the vaporized gas of the organic halogen compound (PCB vaporized gas) by utilizing a catalytic thermal decomposition method and a thermal decomposition method using a radiation heat to make a decomposed gas, and a capturing means 4 for capturing the decomposed material in the decomposed gas, and also performing each of the processes in each of the apparatus under a negative pressure condition to treat them safely without generating harmful substances.

Ken Shinsa
Yoshihide Mukaiyama
Masatoshi Matsuba

JP2001222009A

December 07, 2005

July 23, 2001

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Ken Shinsa

A62D3/40; B01D53/70; B01J19/00; B01J19/12; B09B3/00; C07B35/06; C07B37/06; C07C25/18; H05B6/26; A62D101/22; A62D101/28; (IPC1-7): C07B35/06; B01J19/00; C07B37/06; C07C25/18

JP9079559A
JP200333645A

Isono Dozo

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