Title:
高度に誘発性の複屈折を示す光アドレス指定可能基質および光アドレス指定可能側基ポリマー類
Document Type and Number:
Japanese Patent JP4272260
Kind Code:
B2
Abstract:
Disclosed is an extremely rapidly photo-addressable storage media from inherently slow photo-addressable polymers by irradiating a substrate over a large area with a light source suitable for conventional inscription so that an optical anisotropy, i.e. a double refraction with a preferential direction in the plane of the substrate occurs. If the substrates so prepared are briefly intensively irradiated, the pattern is inscribed extremely rapidly and permanently. The invention also relates to novel side-chain polymers in which high optical anisotropy can be generated by irradiation. This optical anisotropy is very heat stable.
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Inventors:
Bernet, horst
Clausen, Ube
Kostrome, Sergey
Nagle, Ralph
Fezzda, Hans-Joachim
Clausen, Ube
Kostrome, Sergey
Nagle, Ralph
Fezzda, Hans-Joachim
Application Number:
JP54149697A
Publication Date:
June 03, 2009
Filing Date:
May 15, 1997
Export Citation:
Assignee:
Bayer Actien Gezershyaft
International Classes:
C08F220/34; C08J5/18; C08F4/04; C08F8/00; C08F220/38; C08F220/60; C08F246/00; C09B69/10; G03F7/00; G03H1/02; G11B7/24044; G11B7/245; G11B7/2533
Domestic Patent References:
| JP8109226A | ||||
| JP6322040A | ||||
| JP8067068A | ||||
| JP7311979A | ||||
| JP8085259A |
Foreign References:
| WO1996008007A1 |
Attorney, Agent or Firm:
Patent business corporation Odashima patent office
Heigo Odashima
Heigo Odashima