Title:
ORGANIC FILM FORMATION DEVICE, ORGANIC FILM FORMATION SYSTEM AND ORGANIC FILM FORMATION METHOD
Document Type and Number:
Japanese Patent JP2019184230
Kind Code:
A
Abstract:
To provide an organic film formation device, organic film formation system and organic film formation method which can restrict occurrence of sublimate even if a solution containing an organic material and a solvent is heated in an environment where the pressure is reduced to be less than atmospheric pressure.SOLUTION: An organic film formation device in accordance with an embodiment comprises: a chamber capable of keeping atmosphere reduced in pressure to be less than atmospheric pressure; an exhausting part capable of exhausting an inner side of the chamber; a processing area which is provided inside the chamber and in which a work-piece having a base plate and a solution containing an organic material and a solvent applied on the surface of the base plate is supported; a heating part arranged inside the chamber to heat the work-piece; and a control part for controlling the exhausting part and the heating part. The control part controls the exhausting part to apply electrical power to the heating part after an inner pressure of the chamber becomes equal to or less than a predetermined value.SELECTED DRAWING: Figure 2
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Inventors:
TAKAHASHI TAKASHI
ISO AKINORI
ISO AKINORI
Application Number:
JP2019063123A
Publication Date:
October 24, 2019
Filing Date:
March 28, 2019
Export Citation:
Assignee:
SHIBAURA MECHATRONICS CORP
International Classes:
F26B5/04; B05C9/14; B05C11/10; F26B3/04; F26B21/00
Attorney, Agent or Firm:
Masahiko Hinataji