Title:
有機膜形成用組成物、パターン形成方法及び重合体
Document Type and Number:
Japanese Patent JP7209588
Kind Code:
B2
Abstract:
A composition for forming an organic film contains a polymer having a repeating unit shown by formula (1A) as a partial structure, and an organic solvent, where AR1 and AR2 represent a benzene ring or naphthalene ring optionally with a substituent; W1 represents any in formula (1B), and the polymer optionally contains two or more kinds of W1; W2 represents a divalent organic group having 1 to 80 carbon atoms; Ri represents a monovalent organic group having 1 to 10 carbon atoms and an unsaturated bond; and R2 represents a monovalent organic group having 6 to 20 carbon atoms and one or more aromatic rings. This invention provides: an organic film composition which enables excellent film formability, high etching resistance, and excellent twisting resistance without impairing the resin-derived carbon content, and which contains less outgassing-causing sublimation component; a patterning process using the composition; and a polymer suitable for the composition.
Inventors:
Daisuke Gun
Koji Sawamura
Kenta Ishiwata
Takayoshi Nakahara
Koji Sawamura
Kenta Ishiwata
Takayoshi Nakahara
Application Number:
JP2019104739A
Publication Date:
January 20, 2023
Filing Date:
June 04, 2019
Export Citation:
Assignee:
Shin-Etsu Chemical Co., Ltd.
International Classes:
C08L65/00; C08G61/00; G03F7/039; G03F7/11; G03F7/40; H01L21/027
Domestic Patent References:
| JP2014219559A | ||||
| JP2010083963A | ||||
| JP2011052132A | ||||
| JP2019044022A | ||||
| JP2010122656A |
Foreign References:
| WO2013047106A1 |
Attorney, Agent or Firm:
Mikio Yoshimiya
Toshihiro Kobayashi
Toshihiro Kobayashi
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