Title:
ORGANIC FUNCTIONAL LAYER-EQUIPPED SUBSTRATE AND METHOD OF MANUFACTURING THE SAME
Document Type and Number:
Japanese Patent JP2015103598
Kind Code:
A
Abstract:
PROBLEM TO BE SOLVED: To provide an organic functional layer-equipped substrate having a transparent protective film excellent in film stability, and a method of manufacturing the same.SOLUTION: The organic functional layer-equipped substrate has a base material, an organic functional layer disposed on the base material and having heat resistance at 240°C or lower, and a protective film disposed on the organic functional layer. The protective film is composed of silicon oxynitride represented by SiOxNy where x and y satisfy 0.5≤x≤1.0 and -2.2y+2.1≤x≤-2.2y+2.41. When the density of the protective film is ρ (g/m), 2.20 (g/m)≤ρ≤2.60 (g/m) is satisfied.
Inventors:
IMAI SHINJI
Application Number:
JP2013241707A
Publication Date:
June 04, 2015
Filing Date:
November 22, 2013
Export Citation:
Assignee:
FUJIFILM CORP
International Classes:
H01L27/146; G02B5/20; H01L51/42; H01L51/50; H05B33/04; H05B33/10
Domestic Patent References:
| JP2013118365A | 2013-06-13 | |||
| JP2013102145A | 2013-05-23 | |||
| JP2006253422A | 2006-09-21 |
Attorney, Agent or Firm:
Nozomi Watanabe
Haruko Sanwa
Hideaki Ito
Fumio Mitsuhashi
Haruko Sanwa
Hideaki Ito
Fumio Mitsuhashi