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Title:
ORGANOMETALLIC COMPOUNDS
Document Type and Number:
Japanese Patent JP2008110961
Kind Code:
A
Abstract:

To provide organometallic compounds useful for a chemical vapor deposition of thin films and an atomic layer deposition.

Organometallic compounds containing an electron donating group-substituted alkenyl ligand are provided. Such compounds are particularly suitable for use as vapor deposition precursors. Also provided are methods of depositing thin films, such as by ALD and CVD, using such compounds.


Inventors:
SHENAI-KHATKHATE DEODATTA V
WANG QING MIN
Application Number:
JP2007197142A
Publication Date:
May 15, 2008
Filing Date:
July 30, 2007
Export Citation:
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Assignee:
ROHM & HAAS ELECT MAT
International Classes:
C07F15/00; C07F1/08; C07F3/02; C07F5/00; C07F7/00; C07F7/02; C07F9/00; C07F11/00; C07F15/04; C07F17/00; C07F17/02; C23C16/18
Domestic Patent References:
JP2005051192A2005-02-24
JP2001031661A2001-02-06
JP2005146418A2005-06-09
Other References:
JPN6012056194; Dalton Trans. No.11, 2005, p.1930-1939
JPN6012056195; Angew.Chem.Int.Ed. Vol.38, No.18, 1999, p.2759-2761
JPN6012056196; J.Am.Chem.Soc. Vol.127, No.16, 2005, p.5782-5783
JPN6012056197; Eur.J.Inorg.Chem. No.3, 2004, p.469-480
JPN6012056198; Organometallics Vol.16, No.15, 1997, p.3482-3488
JPN6012056199; Journal of Organometallic Chemistry Vol.538, 1997, p.31-40
JPN6012056200; Tetrahedron Letters Vol.46, 2005, p.2539-2542
JPN6012056201; Tetrahedron Letters Vol.39, 1998, p.419-422
JPN6012056202; J.Am.Chem.Soc. Vol.124, No.48, 2002, p.14324-14325
JPN6012056203; J.Am.Chem.Soc. Vol.122, No.30, 2000, p.7424-7425
JPN6012056205; Tetrahedron Letters Vol.40, 1999, p.217-218
JPN6012056207; Tetrahedron Vol.54, 1998, p.5557-5574
JPN6012056208; Tetrahedron Letters Vol.40, 1999, p.2331-2334
JPN6012056211; J.Chem.Soc.,Perkin Trans.1 No.7, 1998, p.1309-1314
JPN6012056192; Journal of Organometallic Chemistry Vol.683, 2003, p.331-336
JPN6012056193; Olganometallics Vol.19, No.7, 2000, p.1308-1318
Attorney, Agent or Firm:
Patent Business Corporation Sender International Patent Office