To provide an oxide evaporation material in which a high-refractive-index transparent film of low resistance and high transmittance in the visible to near-infrared region can be consistently manufactured even when the amount of oxygen to be introduced during the film deposition is small, and a high-refractive-index transparent film to be manufactured by using the oxide evaporation material.
The oxide evaporation material mainly consists of indium oxide, and is constituted of a sintered body containing cerium with its Ce/In atomic ratio being >0.110 and ≤0.538, and the L* value in the CIE1976 color space is 62-95. The oxide evaporation material with the L* value of 62 to 95 has an optimal oxygen amount. Accordingly, even when a small amount of oxygen gas is introduced into a film deposition vacuum chamber, a high-refractive-index transparent film having the refractive index of 2.15 to 2.51 at a wavelength of 550 nm, a low resistance, and a high transmittance in the visible to near-infrared region is formed by vacuum deposition methods. Since the introduced oxygen gas amount is small, the difference in composition between the film and the evaporation material is made small, and the fluctuation in the film composition or characteristic during the mass production can be reduced.
WAKE RIICHIRO
KUWAHARA MASAKAZU
MAENO YASUYUKI
| JP2005242264A | 2005-09-08 | |||
| JPH0343911A | 1991-02-25 | |||
| JPH09171717A | 1997-06-30 | |||
| JPH09123337A | 1997-05-13 |
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