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Title:
PATTERN FORMING DEVICE
Document Type and Number:
Japanese Patent JP2010110664
Kind Code:
A
Abstract:

To provide a pattern forming device which suppresses contamination of a drawing surface due to satellite droplets, with respect to the pattern forming device for irradiating flying droplets with light to dry the flying droplets.

A driving signal supplied to each piezoelectric element is set so that the speed of a cutting point in the nozzle side of the satellite droplets in the cutting of the satellite droplets from the nozzle is made higher than the speed of main droplets to unite the main droplet and the satellite droplets with each other after the main droplets and the satellite droplet fly only by an isolated flight space. That is, the rate of the change of a fifth wave shape part 75 regulating the speed of the cutting point of the satellite droplet in the nozzle side is made larger than the rate of change of a third wave shape part 73 regulating the main droplet. The satellite droplet with the discharge of the main droplet is united with the preceding main droplet and deposited on the drawing surface. Thus the contamination of the drawing surface due to the satellite droplets is suppressed.


Inventors:
MIURA HIROTSUNA
Application Number:
JP2008283112A
Publication Date:
May 20, 2010
Filing Date:
November 04, 2008
Export Citation:
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Assignee:
SEIKO EPSON CORP
International Classes:
B05C5/00
Attorney, Agent or Firm:
Masahiko Ueyanagi
Osamu Suzawa
Kazuhiko Miyasaka



 
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