PATTERN FORMING ELEMENT

Japanese Patent JP3827910

B2

PROBLEM TO BE SOLVED: To provide a pattern forming element obtained by efficiently forming a pattern made of a site having different wettability by irradiating the site with an energy.
SOLUTION: The pattern forming element comprises a base plate, and a photocatalyst-containing layer provided on the plate. In this case, the layer changes its wettability so as to reduce a contact angle with a liquid by an operation of a photocatalyst by irradiating the layer with the energy, and the layer contains at least the photocatalyst, a metal element as a second component for improving a reducing speed of the contact angle with the liquid when irradiated with the energy and a binder. Further, the layer contains the pattern made of the site having the different wettability thereon.

JP3801192	RADIATION-CURING COMPOSITION, METHOD FOR STORING THE SAME, METHOD FOR FORMING CURED FILM, METHOD FOR FORMING PATTERN, METHOD FOR USING PATTERN, ELECTRONIC COMPONENT AND OPTICAL WAVEGUIDE
WO/2014/117496	ALKALI DEVELOPMENT TYPE PHOTOSENSITIVE RESIN COMPOSITION, DRY FILM AND CURED PRODUCT THEREOF, AND PRINTED CIRCUIT BOARD FORMED BY USING SAME
JP2001056552	RADIATION SENSITIVE RESIN COMPOSITION

Hironori Kobayashi

JP2000084714A

September 27, 2006

March 22, 2000

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Dai Nippon Printing Co.,Ltd.

G03F7/004; B01J23/745; B01J35/02; B32B9/00; G02B3/00; G02B5/20; G03F7/075; (IPC1-7): B32B9/00; B01J23/745; B01J35/02; G02B3/00; G02B5/20; G03F7/004; G03F7/075

JP11174664A
JP2000003046A
JP2000289359A

Navio, Jose A. et al.,Iron-doped titania powders prepared by a sol-gel method. Part II: Photocatalytic properties,Applied Catalysis A: General,NL,Elsevier Science B.V.,1999年,Vol. 178,191-203

Akihiko Yamashita
Kishimoto Tatsuto

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