Title:
パターン形成方法および物品製造方法
Document Type and Number:
Japanese Patent JP7222623
Kind Code:
B2
Abstract:
A method includes first step of forming first pattern in each of first region of a substrate by using scanning exposure apparatus, and second step of forming second pattern in each second region of the substrate having undergone the first step. Each second region includes at least two first regions, and in the first step, scanning direction in the scanning exposure apparatus is allocated to each of the at least two first regions. Combination of the scanning directions allocated to the at least two first regions is common to the second regions. The combination is determined such that the scanning directions of at least first regions, of the at least two first regions, which are arranged in a direction perpendicular to the scanning directions are alternately changed one by one.
Inventors:
Shin Takakura
Application Number:
JP2018138012A
Publication Date:
February 15, 2023
Filing Date:
July 23, 2018
Export Citation:
Assignee:
Canon Inc
International Classes:
H01L21/027; B29C59/02; G03F7/20
Domestic Patent References:
| JP2015029070A | ||||
| JP2016154241A | ||||
| JP2017219833A |
Attorney, Agent or Firm:
Patent Attorney Corporation Otsuka International Patent Office