Title:
PATTERN FORMING METHOD USING SURFACE MODIFIED CARBON NANOTUBE
Document Type and Number:
Japanese Patent JP2004167677
Kind Code:
A
Abstract:
To provide a method to form a pattern thin film by introducing a working group having double bond to a surface of a carbon nanotube by a chemical method and by optical hardening of the carbon nanotube surface-modified in this way.
A negative pattern of the carbon nanotube is formed by introducing the working group having double bond free to participate in radical polymerization to the surface of the carbon nanotube, coating the carbon nanotube with an optical initiator on a base material by dispersing them in an organic solvent and removing a non-exposed part with a developing solution after inducing radical polymerization of the carbon nanotube with the exposed part by exposing it to UV through a photo-mask.
Inventors:
PARK SHOSHIN
RI ZAISHUN
JUNG MYUNG SUP
RI ZAISHUN
JUNG MYUNG SUP
Application Number:
JP2003375753A
Publication Date:
June 17, 2004
Filing Date:
November 05, 2003
Export Citation:
Assignee:
SAMSUNG ELECTRONICS CO LTD
International Classes:
G03F7/029; B82B3/00; B82Y20/00; B82Y40/00; C08F2/50; G03F1/08; G03F7/00; G03F7/027; G03F7/038; H05K3/02; H01L51/00; (IPC1-7): B82B3/00; C08F2/50; G03F7/029; G03F7/038
Attorney, Agent or Firm:
Mikio Hatta
Atsushi Nogami
Yasuo Nara
Etsuko Saito
Katsuyuki Utani
Toshifumi Fujii
Atsushi Nogami
Yasuo Nara
Etsuko Saito
Katsuyuki Utani
Toshifumi Fujii
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