Title:
PATTERN-INSPECTION METHOD AND APPARATUS, AND MASK- MANUFACTURING METHOD
Document Type and Number:
Japanese Patent JP2003287419
Kind Code:
A
Abstract:
To provide an accurate mask pattern-inspection method, an accurate mask pattern-inspection apparatus, and a manufacturing method of a mask using the apparatus.
When reference data are to be compared with sensor data by a comparison means 6, a correction value where an adjacent pattern whose measurement is completed is corrected by predetermined pattern conditions.
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Inventors:
OKUDA KENTARO
SAWA EIJI
INOUE HIROSHI
SAWA EIJI
INOUE HIROSHI
Application Number:
JP2002088817A
Publication Date:
October 10, 2003
Filing Date:
March 27, 2002
Export Citation:
Assignee:
TOSHIBA CORP
International Classes:
G01B11/30; G01B21/30; G01N21/956; G03F1/68; G03F1/84; G06T1/00; G06T7/00; H01L21/027; H01L21/66; (IPC1-7): G01B21/30; G01B11/30; G01N21/956; G03F1/08; G06T1/00; G06T7/00; H01L21/027; H01L21/66
Domestic Patent References:
JP2001272217A | 2001-10-05 | |||
JPH10260021A | 1998-09-29 | |||
JPH11160039A | 1999-06-18 | |||
JPH0325357A | 1991-02-04 | |||
JP2001338304A | 2001-12-07 | |||
JPH056928A | 1993-01-14 | |||
JPH04109104A | 1992-04-10 | |||
JPS6031235A | 1985-02-18 |
Attorney, Agent or Firm:
Norio Ogo (2 outside)