Title:
パターン検査システム
Document Type and Number:
Japanese Patent JP7144244
Kind Code:
B2
Abstract:
A pattern inspection system inspects an image of an inspection target pattern of an electronic device using an identifier constituted by machine learning, based on the image of the inspection target pattern of the electronic device and data used to manufacture the inspection target pattern. The system includes a storage unit which stores a plurality of pattern images of the electronic device and pattern data used to manufacture a pattern of the electronic device, and an image selection unit which selects a learning pattern image used in the machine learning from the plurality of pattern images, based on the pattern data and the pattern image stored in the storage unit.
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Inventors:
To Show
Shinichi Shinoda
Yasutaka Toyota
Hiroyuki Shindo
Shinichi Shinoda
Yasutaka Toyota
Hiroyuki Shindo
Application Number:
JP2018162607A
Publication Date:
September 29, 2022
Filing Date:
August 31, 2018
Export Citation:
Assignee:
Hitachi High-Tech Co., Ltd.
International Classes:
G06T7/00; G06V10/764
Domestic Patent References:
JP2016173615A | ||||
JP2016058465A | ||||
JP2010157154A |
Foreign References:
US20170047195 |
Attorney, Agent or Firm:
Polar Patent Attorney Corporation