Title:
パターン計測方法、パターン計測装置、およびパターン計測プログラム
Document Type and Number:
Japanese Patent JP7346644
Kind Code:
B2
Abstract:
To correctly measure information to give feedback to an etching process, that is, the bottom dimension of a pattern being machined, the pattern tilt, and the pattern depth.SOLUTION: In a charged particle beam device provided with an arithmetic device that performs calculation for measuring the dimension of a pattern formed on a sample on the basis of a signal obtained by irradiating the sample with a charged particle beam, the arithmetic device calculates the amount of inclination of the pattern from the calculated value of the amount of misalignment on the basis of the calculated value of the amount of misalignment in a direction parallel to the sample surface between two patterns of different heights obtained from the image acquired at an arbitrary beam tilt angle, and a relational expression between the amount of misalignment and the amount of inclination of the pattern obtained in advance.SELECTED DRAWING: Figure 1A
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Inventors:
Takuma Yamamoto
Hiroya Ota
Kenji Tanimoto
Yusuke Abe
Tomohiro Tamori
Masaaki Nojiri
Hiroya Ota
Kenji Tanimoto
Yusuke Abe
Tomohiro Tamori
Masaaki Nojiri
Application Number:
JP2022047823A
Publication Date:
September 19, 2023
Filing Date:
March 24, 2022
Export Citation:
Assignee:
Hitachi High-Tech Co., Ltd.
International Classes:
H01J37/22; G01B15/00; H01J37/147; H01J37/28
Domestic Patent References:
| JP2014216490A | ||||
| JP2021082595A | ||||
| JP2011077299A |
Foreign References:
| WO2019073592A1 | ||||
| WO2017179138A1 | ||||
| WO2011013342A1 |
Attorney, Agent or Firm:
Patent Attorney Corporation Hiraki International Patent Office