Title:
PATTERNABLE LOW DIELECTRIC CONSTANT MATERIAL AND ITS USE IN ULSI INTERCONNECTION
Document Type and Number:
Japanese Patent JP3935874
Kind Code:
B2
Abstract:
PROBLEM TO BE SOLVED: To provide a dielectric material having a low dielectric constant (low k) and not requiring a number of mask layers or processing steps as a dielectric material used for an interconnection structure of integrated circuits.
SOLUTION: A composition containing a functionalized polymer having one or more acid-sensitive groups capable of imaging is provided. The polymer is a low k polymer or a polymer convertible to a low k polymer after succeeding processing with heat or light. Specifically, the polymer may be hydrocarbon, fluorinated hydrocarbon, organosilicate or silsesquioxane.
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Inventors:
Kinhan Lin
Ratnam Suryakumaran
Ratnam Suryakumaran
Application Number:
JP2003421691A
Publication Date:
June 27, 2007
Filing Date:
December 18, 2003
Export Citation:
Assignee:
INTERNATIONAL BUSINESS MASCHINES CORPORATION
International Classes:
G03F7/075; C08G77/04; C08G77/14; C08G77/24; C08K5/00; C08L83/06; C09D183/08; G03F7/004; G03F7/038; H01L21/312; H01L21/316; H01L21/3205; H01L21/768; H01L23/522; H01L23/532; (IPC1-7): G03F7/075; C08G77/14; C08K5/00; C08L83/06; H01L21/312; H01L21/3205; H01L21/768
Domestic Patent References:
JP2000281790A | ||||
JP10268520A | ||||
JP10186669A | ||||
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Foreign References:
US6162838 | ||||
US6143643 | ||||
US5895263 | ||||
EP1249846A1 |
Attorney, Agent or Firm:
Hiroshi Sakaguchi
Yoshihiro City
Takeshi Ueno
Yoshihiro City
Takeshi Ueno
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