PHASE SHIFT MASK BLANK, PHOTOMASK BLANK AS WELL AS MANUFACTURING APPARATUS AND MANUFACTURING METHOD FOR THE SAME

Title:

PHASE SHIFT MASK BLANK, PHOTOMASK BLANK AS WELL AS MANUFACTURING APPARATUS AND MANUFACTURING METHOD FOR THE SAME

Document Type and Number:

Japanese Patent JP2002090977

Kind Code:

A

Abstract:

To provide a manufacturing apparatus, manufacturing method, etc., capable of manufacturing phase shift mask blanks of ≤0.1 pieces per square inch in the total number of particles and pinholes of a diameter larger about half the exposure wavelength in optical semi-transmittable films.

For example, a target surface is arranged to face downward with respect to the gravity direction in a DC magnetron sputtering device for the manufacturing halftone type phase shift mask blanks and an angle portion 5a of a target end and an angle portion of an earth shield are subjected to curved surface working (rounding) by using a full-surface erosion cathode, and the target end 5b, an exposed backing plate surface 4b and the surface of the earth shield 12 are roughened. The earth shield 12 is arranged nearer the upper part (backing plate surface) than the target surface d.

Inventors:

NOZAWA JUN
MITSUI MASARU
OTSUKA HITOSHI
MITSUI HIDEAKI

Application Number:

JP2000277260A

Publication Date:

March 27, 2002

Filing Date:

September 12, 2000

Export Citation:

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Assignee:

HOYA CORP

International Classes:

C23C14/34; C23C14/56; G03F1/26; G03F1/32; G03F1/50; G03F1/68; G03F7/20; H01L21/027; G03F1/00; (IPC1-7): G03F1/08; C23C14/34; G03F7/20; H01L21/027

Attorney, Agent or Firm:

Yasuo Fujimura

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