Title:
1,1,1,3,3-ペンタフルオロプロパンの光塩素化
Document Type and Number:
Japanese Patent JP2005510549
Kind Code:
A
Abstract:
A process for preparing 1-chloro-1,1,3,3,3-pentafluoropropane, CF3CH2CF2Cl, comprising contacting in a reaction zone in the substantial absence of oxygen, reactants comprising chlorine and 1,1,1,3,3-pentafluoropropane, CF3CH2CHF2 (also referred to as HFC-245fa), and subjecting the reactants to actinic radiation, such as UV light at about 2,000 to 4,000 Angstroms, wherein: (1) inert gas is present at a concentration equal to or less than about 5 wt. % of the total weight of reactants; (2) the molar ratio of chlorine to CF3CH2CHF2 is from about 0.2:1 to about 1.5:1; and (3) the concentration of chlorinated product produced having greater than one chlorine present in the molecule is less than or equal to about 10 wt. %.
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Inventors:
Harida Sankei, Nia
Shankland, Ian Earl
Bradley, David E
Cheney, Martin Yi
POS, Andrew Jay
Demin, Timothy Earl
Narvajek, David
Van der Puy, Michael
Shankland, Ian Earl
Bradley, David E
Cheney, Martin Yi
POS, Andrew Jay
Demin, Timothy Earl
Narvajek, David
Van der Puy, Michael
Application Number:
JP2003547338A
Publication Date:
April 21, 2005
Filing Date:
November 22, 2002
Export Citation:
Assignee:
Honeywell International Inc.
International Classes:
C07C17/10; C07C17/383; C07C17/395; C07C19/10; (IPC1-7): C07C17/10; C07C17/383; C07C17/395; C07C19/10
Domestic Patent References:
| JPS4941166B1 | 1974-11-07 | |||
| JPH06510797A | 1994-12-01 | |||
| JPS56169632A | 1981-12-26 | |||
| JPH04154734A | 1992-05-27 | |||
| JPH11512454A | 1999-10-26 | |||
| JP2000508315A | 2000-07-04 | |||
| JPH02286779A | 1990-11-26 | |||
| JP2000508315A | 2000-07-04 | |||
| JP2001058967A | 2001-03-06 |
Attorney, Agent or Firm:
Kazuo Shamoto
Tadashi Masui
Yasushi Kobayashi
Akio Chiba
Hiroyuki Tomita
Okimoto Kazuaki
Tadashi Masui
Yasushi Kobayashi
Akio Chiba
Hiroyuki Tomita
Okimoto Kazuaki