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Patent Searching and Data


Title:
PHOTOCURABLE RESIN COMPOSITION
Document Type and Number:
Japanese Patent JPS62236814
Kind Code:
A
Abstract:

PURPOSE: To obtain a photocurable resin composition which is low in a curing shrinkage, flexible and lowly viscous, by using a specified polyether (mono) methacrylate and a photopolymerization initiator and specifying the curing shrinkage of the obtained mixture and the hardness and viscosity of a cured article.

CONSTITUTION: A resin composition containing a polyether mono(meth)acrylate which is a mono(meth)acrylate (A) of a propylene oxide/tetrahydrofuran copolymer of a number-average MW ≥1,300 and a photopolymerization initiator (B) as essential components and a silane coupling agent (C) and/or a polyalkylene glycol or its ether (D) as optional components and having a curing shrinkage ≤2%, a harness of a cured article ≤30 (Shore A hardness) and a viscosity at 25°C ≥300cP. The silane coupling agent is useful for durability after bonding, especially when this composition is used as an adhesive for laminating glass.


Inventors:
ITO SHUNJI
FUKUTAKA EITARO
UKITA KENKICHI
Application Number:
JP7929486A
Publication Date:
October 16, 1987
Filing Date:
April 08, 1986
Export Citation:
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Assignee:
DENKI KAGAKU KOGYO KK
International Classes:
B32B17/10; C08F2/48; C08F290/00; C08F299/02; C09J4/00; (IPC1-7): B32B17/10; C08F2/48; C08F299/02; C09J3/16