Title:
PHOTOGRAPHIC SUBSTRATE
Document Type and Number:
Japanese Patent JP3779340
Kind Code:
B2
Abstract:
PURPOSE: To obtain a photographic substrate excellent in hygroscopic dimensional stability and workability by specifying the humidity expansion coefficient.
CONSTITUTION: The humidity expansion coefficient of this photographic substrate is controlled to be >1×10-6 to 8×10-6/% RH, preferably to be 1.2×10-6 to 5×10-6/% RH and more preferably to be 1.4×10-6 to 2.5×10-6/% RH. In this case, the syndiotactic polystyrenic polymer to be used for the substrate has a steric structure, wherein phenyl group or its derivative as the side chain is alternately provided on the opposite sides of the principal chain formed by a carbon-carbon bond, and the tacticity is generally and precisely determined by the nuclear magnetic resonance (13C-NMR method) using isotopic carbon. Sterospecific polystyrene, poly(alkylstyrene), poly(halogenated styrene), poly(alkoxystyrene), etc., are exemplified as the styrene polymer.
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Inventors:
Hashimoto Saiwa
Application Number:
JP5561594A
Publication Date:
May 24, 2006
Filing Date:
March 25, 1994
Export Citation:
Assignee:
Fuji Photo Film Co., Ltd.
International Classes:
G03C1/795; C08F12/00; C08J5/18; C08L25/00; (IPC1-7): G03C1/795; C08F12/00; C08J5/18; C08L25/00
Domestic Patent References:
| JP5289236A | ||||
| JP3131843A |
Attorney, Agent or Firm:
Toshizo Iida