Title:
ＩＣまたはＬＣＤフォトリソグラフィ用のフォトマスク用基板
Document Type and Number:
Japanese Patent JP7037445
Kind Code:
B2
Abstract:
To provide a photomask substrate and process for producing the same, that enables identification of substrate processing direction without applying processing of peculiar shape to the substrate as much as possible.SOLUTION: The photomask substrate 1 according to the present invention is a photomask substrate 1 having two main surfaces 2 facing each other, side surfaces 3 formed between the two main surfaces, and corner portions 4a,4b,4c,4d in which R-surface processing is applied between two adjacent side surfaces of the side surfaces, and in which the R-surface curvature radius of the corner portion, for example, 4a is formed to a dimension different from the R-surface curvature radius of any of the other corner portions 4b,4c,4d.SELECTED DRAWING: Figure 1
Inventors:
Megumi Izoe
Application Number:
JP2018120463A
Publication Date:
March 16, 2022
Filing Date:
June 26, 2018
Export Citation:
Assignee:
CoorsTek Co., Ltd.
International Classes:
B24B9/00; G03F1/60; B24B9/10; C03C19/00
Domestic Patent References:
| JP2003114501A | ||||
| JP2017007043A | ||||
| JP2005221705A | ||||
| JP10118907A | ||||
| JP2015063415A | ||||
| JP2082244A | ||||
| JP2014232263A | ||||
| JP2000356849A |
Attorney, Agent or Firm:
Shigeru Kinoshita
Yuko Sawada
Yuko Sawada
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