Title:
PHOTOMASK
Document Type and Number:
Japanese Patent JP2006349756
Kind Code:
A
Abstract:
To provide a photomask which facilitates defect inspection and which facilitates handling of CAD data.
The photomask includes: a hole pattern group comprising of a plurality of hole patterns which are densely arranged; and an auxiliary pattern arranged near the hole pattern group and correcting an optical proximity effect in two or more of the hole patterns.
Inventors:
OMORI KIYOSHIGE
Application Number:
JP2005172552A
Publication Date:
December 28, 2006
Filing Date:
June 13, 2005
Export Citation:
Assignee:
SHARP KK
International Classes:
G03F1/30; G03F1/32; G03F1/36; G03F1/70
Attorney, Agent or Firm:
Shintaro Nogawa
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