Login| Sign Up| Help| Contact|

Patent Searching and Data


Title:
光パターニング可能なフッ素フリーフェノール官能基含有ポリマー組成物
Document Type and Number:
Japanese Patent JP6605720
Kind Code:
B2
Abstract:
Various polycycloolefinic polymers containing phenolic pendent groups and compositions thereof useful for forming self-imageable films encompassing such polymers are disclosed. Such polymers encompass norbornene-type repeating units containing phenolic pendent groups which contain very low levels of fluorine containing monomers. The films formed from such polymer compositions provide self imageable, low-k, thermally stable layers for use in microelectronic and optoelectronic devices.

Inventors:
Edmond, Else
Lois, groff
Application Number:
JP2018515559A
Publication Date:
November 13, 2019
Filing Date:
September 27, 2016
Export Citation:
Click for automatic bibliography generation   Help
Assignee:
Promelas, LLC
International Classes:
C08F232/00; C08L45/00; C08L63/00; G03F7/023
Domestic Patent References:
JP2014504310A
JP2010519340A
JP2008506010A
JP2010519594A
Foreign References:
US20110104614
Attorney, Agent or Firm:
Makoto Abe
Michiko Oi
Seiji Tani